Quantum Chemical Analysis of Electroless Deposition Processes

Elementary processes in chemical vapor deposition: quantum chemical approach

Chemical vapor deposition (CVD) is one of the key technologies for the epitaxial crystal growth of semiconductors. In order to obtain high-performance devices, atomically controlled thin films are required. Layer by layer growth consists of various processes, i.e ., the thermal decomposition of precursors, the adsorption of growing species, their surface migration, two-dimensional nucleation, t...

Multiscale modeling and systemic analysis of chemical vapor deposition processes

Two multiscale computational frameworks are proposed for coupling/linking the co-existing scales in chemical vapor deposition (CVD)processes: From the macro-scale of a CVD reactor (~cm or m) to the transport inside micro-features (~μm) and kinetic Monte Carlo techniques in the nano-scale (~nm). To accelerate the computations parallel processing techniques are used. Moreover, a computational fra...

Electroless Deposition and Electroplating of Metals

A Quantum Chemical Exploration of SiC Chemical Vapor Deposition

................................................................................................. iii Sammanfattning ..................................................................................... iv Acknowledgement ................................................................................... v List of included publications ..............................................................

Optimizing Electroless Nickel Pretreatment Processes

The pretreatment of the substrate, prior to Electroless Nickel (EN) plating, plays an important role in the corrosion protection provided by the EN deposit. Many factors in the pretreatment process can affect the corrosion resistance of the EN deposit. The details of mechanical treatment, chemical/elecuo polishing, acid activation, and pre-processing procedure (such as nickel strike) are among ...